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HONG KONG, Dec. 4, 2025 /PRNewswire/ -- The board of directors of InnoScience (Suzhou) Technology Holding Co., Ltd is pleased to announce the Company's victory in its lawsuit with Infineon. On December 02, 2025, U.S. Eastern Time, the U.S. International Trade Commission (the "ITC") issued a ruling in the Section 337 investigation initiated by Infineon against InnoScience. With respect to the two patents involved, the ITC ruled that InnoScience did not infringe on one of the patents at all, and that InnoScience's workaround design (the design solution currently used in its products) did not infringe on the other patent at all. This ruling by the ITC further clarifies the status of InnoScience's relevant intellectual property and will clear the way for its future global development. The Company will continue to respect and protect intellectual property rights and is committed to providing excellent GaN-on-silicon power solutions for global customers.
The Commission's final determination could lead to an import ban of Innoscience's allegedly infringing products into the U.S. The ruling is another positive decision which underscores the value of Infineon's industry leading patent portfolio GaN plays a pivotal role in enabling high-performance and energy-efficient power systems MUNICH, Dec. 3, 2025 /PRNewswire/ -- The U.S. International Trade Commission (ITC) found the violation of one patent owned by Infineon Technologies AG (FSE: IFX) (OTCQX: IFNNY) concerning gallium nitride (GaN) technology by Innoscience.[1] In addition, in this preliminary decision, the ITC confirmed that both patents asserted by Infineon in the proceedings before the ITC are legally valid.[2] The case centers on the unauthorized use of Infineon's patented GaN technologies by Innoscience. The Commission's final determination is expected to be issued on April 2, 2026. If this preliminary decision will be confirmed, it will lead to an import ban of Innoscience's allegedly infringing products into the United States of America. "This ruling is another testament to the strength of Infineon's intellectual property and confirms our commitment to vigorously defend our patent portfolio against infringements and ensuring fair competition in the market," says Dr. Johannes Schoiswohl, Senior Vice President and Head of Infineon's GaN Systems Business Line. "We remain dedicated to fostering innovation and advancing semiconductor technology to address the world's most pressing challenges, from decarbonization to digital transformation." The ruling is yet another positive decision which underscores the value of Infineon's contributions to GaN technology. In a parallel dispute in Germany, the German patent office recently confirmed the validity of a patent of Infineon and upheld it in slightly amended form. Infineon is asserting infringement of this patent in the Munich District Court.[3] Already in August 2025, the Munich District Court I (Landgericht München I) found infringement of another Infineon patent by Innoscience.[4] Infineon is a leading integrated device manufacturer (IDM) in the GaN market with the industry's broadest IP portfolio, comprising approximately 450 GaN patent families. With higher power density, faster switching speeds, and lower power losses, GaN semiconductors enable smaller designs, reducing energy consumption and heat generation. As a leader in power systems, Infineon is mastering all three relevant materials: silicon (Si), silicon carbide (SiC) and gallium nitride. Press Contact: Andre Tauber, andre.tauber@infineon.com, Tel. +49 89 343 6705 [1] US 9,899,481[2] US 9,899,481 and US 9,070,755[3] DE102017100947[4] DE102014113465
New enterprise solution streamlines IP and R&D patent reviews and accelerates freedom to operate, patentability, and infringement related decisions LONDON, Nov. 24, 2025 /PRNewswire/ -- Clarivate Plc (NYSE: CLVT), a leading global provider of transformative intelligence, today announced the launch of Derwent Patent Monitor to streamline intellectual property (IP) and research and development (R&D) collaborative patent reviews when determining patentability, assessing freedom to operate (FTO) and evaluating opposition or assertion. Built with proprietary data, Derwent Patent Monitor offers AI-powered evaluation of potential threats helping to accelerate first-pass reviews (Threat Analysis) to surface the most critical risks for stakeholders. This feature empowers patent professionals to proceed quickly and with higher confidence. Shandon Quinn, Vice President, Patent Intelligence, Clarivate, said: "One of the biggest challenges IP leaders mention to me is upgrading their team's partnership with R&D for filing stronger patents and minimizing infringement risk. Yet too often the process is slowed down by siloed teams and disjointed tools and processes. Derwent Patent Monitor is the first tool of its kind to bring together flexible collaboration and review workflows, unique Derwent patent data and AI technology to help teams quickly identify potential risks and accelerate critical IP decisions for FTO, opposition and patent filing." The new software is built on proprietary data from the Derwent World Patents Index (DWPI), the world's most comprehensive database of 67m+ invention summaries written by 850+ Clarivate subject matter experts to help collaborators save time when reviewing patents of interest. Purpose-built for collaboration, Derwent Patent Monitor helps patent teams save time and boost efficiency through structured, project-based reviews and real-time feedback - eliminating the need for scattered emails and spreadsheets. Teams become more aligned and informed on key reviews, enabling a faster, more connected patent monitoring process. To learn more, please visit Derwent Patent Monitor. About ClarivateClarivate is a leading global provider of transformative intelligence. We offer enriched data, insights & analytics, workflow solutions and expert services in the areas of Academia & Government, Intellectual Property and Life Sciences & Healthcare. For more information, please visit www.clarivate.com Media contact:Sofia Nogués, Sr. External Communications Managernewsroom@clarivate.com
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